Name: Yeung (Billy) Au
Email: yeungau@fas.harvard.edu
Position: Graduate Student
Undergraduate University: University of California, Berkeley
Office: M130a
Lab: M-130
Project: CVD and ALD study of materials for future copper interconnects




Name: Dr. Harish Bhandari
Email: bhandari@chemistry.harvard.edu
Position: Post-Doctoral Fellow
Graduate University: University of Alabama
Office: C010
Lab: C011
Project: Deposition and Plasma Processing of CVD and ALD metal thin films





Name: Jaeyeong Heo
Email: jheo@fas.harvard.edu
Position: PostDoctoral Fellow
Undergraduate University: Seoul National University
Office: CV101B
Lab: CV108
Project: 1) ALD study of transparent Conductive Tin Oxide films 2) ALD of high-k materials





Name: Dr. Adam Hock
Email: ahock@fas.harvard.edu
Position: Post-Doctoral Fellow
Graduate University: Massachusetts Institute of Technology
Office: M123
Lab: M123
Project: The design and synthesis of new ligand architectures and metal complexes for use as atomic layer deposition precursors. The focus is on the support of low valent early transition metal complexes.




Name: Zhefeng Li
Email: li12@fas.harvard.edu
Position: Graduate Student
Undergraduate University: University of Science and Technology of China
Office: C110
Lab: C108
Project: Area Selective Atomic Layer Deposition




Name: Dr. Youbo Lin
Email: ylin@fas.harvard.edu
Position: Post-Doctoral Fellow
Graduate University: Harvard University
Office: M137
Lab: C011, C010
Project: Fabrication and characterization of advanced thin films deposited by means of the atomic layer deposition (ALD) and chemical vapor deposition (CVD).




Name: Yiqun Liu
Email: yiqunliu@fas.harvard.edu
Position: Graduate Student
Undergraduate University: University of Science and Technology of China
Office: CV110
Lab: CV109
Project: ALD of high k materials and electronic property characterization.




Name: Hisashi Nakagawa
Email: nakagawa@fas.harvard.edu
Position: Visiting Scholar
Undergraduate University: Kyoto University
Office: M122-123
Lab: M122-123
Project: Research on high-k dielectrics




Name: Wontae Noh
Email: noh@fas.harvard.edu
Position: PostDoctoral Fellow
Undergraduate University: University of Illinois at Urbana-Champaign
Office: M122
Lab: M122
Project: 1) Synthesis and characterization of guanidinate complexes as precursors for ALD and CVD 2) Synthesis and characterization of self-catalyzed ALD precursors for pure SiO2 thin films



Name: Dawen Pang
Email: dwpang@deas.harvard.edu
Position: Staff Scientist
Office: C010
Lab: C010
Project: Development of Transparent Conductive Films and Anti-Corrosion Films



Name: Helen Park
Position: Graduate Student
Undergraduate University: University of Rochester
Office: M130a
Lab: C109
Project: Selective Deposition of CVD Cobalt






Name: Prasert Sinsermsuksakul
Email: psinserm@fas.harvard.edu
Position: Graduate Student
Undergraduate University: UC Berkeley
Office: M130a
Project: Thin films study for photovoltaic applications




Name: Hongtao Wang
Email: htwang@seas.harvard.edu
Position: Graduate Student
Undergraduate University: Tsinghua University
Office: M137
Lab: C011
Project: Deposition of ALD thin films




Name: Sheng Xu
Email: shengxu@fas.harvard.edu
Position: Graduate Student
Office: Converse 108
Lab: M130A
Project: Carbon nanotube Fabrication and Coating