Name: Yeung (Billy) Au
Email: yeungau@fas.harvard.edu
Position: Graduate Student
Undergraduate University: University of California, Berkeley
Office: M130a
Lab: M-130
Project: CVD and ALD study of materials for future copper interconnects




Name: Dr. Harish Bhandari
Email: bhandari@chemistry.harvard.edu
Position: Post-Doctoral Fellow
Graduate University: University of Alabama
Office: C010
Lab: C011
Project: Deposition and Plasma Processing of CVD and ALD metal thin films




Name: Dr. Adam Hock
Email: ahock@fas.harvard.edu
Position: Post-Doctoral Fellow
Graduate University: Massachusetts Institute of Technology
Office: M123
Lab: M123
Project: The design and synthesis of new ligand architectures and metal complexes for use as atomic layer deposition precursors. The focus is on the support of low valent early transition metal complexes.




Name: Dr. Hoon Kim
Email: hoonkim@fas.harvard.edu
Position: Post-Doctoral Fellow
Graduate University: University of Tokyo
Office: C010
Lab: C09
Project: CVD study for Future Cu interconnects





Name: Dr. Jean-Sebastien Lehn
Email: jslehn@gmail.com
Position: Post-Doctoral Fellow
Graduate University: University of Houston
Office: M123
Lab: M123
Project: Synthesis of low-valence early transition metal amidinate complexes as precursors to the deposition of metal oxide, metal nitride and metallic thin films by ALD





Name: Zhefeng Li
Email: li12@fas.harvard.edu
Position: Graduate Student
Undergraduate University: University of Science and Technology of China
Office: C110
Lab: C108
Project: Area Selective Atomic Layer Deposition




Name: Dr. Youbo Lin
Email: ylin@fas.harvard.edu
Position: Post-Doctoral Fellow
Graduate University: Harvard University
Office: M137
Lab: C011, C010
Project: Fabrication and characterization of advanced thin films deposited by means of the atomic layer deposition (ALD) and chemical vapor deposition (CVD).




Name: Yiqun Liu
Email: yiqunliu@fas.harvard.edu
Position: Graduate Student
Undergraduate University: University of Science and Technology of China
Office: CV110
Lab: CV109
Project: ALD of high k materials and electronic property characterization.




Name: Dawen Pang
Email: dwpang@deas.harvard.edu
Position: Staff Scientist
Office: C010
Lab: C010
Project: Development of Transparent Conductive Films and Anti-Corrosion Films




Name: Leonard Rodriguez
Email: rodrig@fas.harvard.edu
Position: Graduate Student
Undergraduate University: McGill University
Office: M121
Lab: C013
Project: Deposition of metal films by ALD




Name: Prasert Sinsermsuksakul
Email: psinserm@fas.harvard.edu
Position: Graduate Student
Undergraduate University: UC Berkeley
Office: M130a
Project: Thin films study for photovoltaic applications




Name: Hongtao Wang
Email: htwang@seas.harvard.edu
Position: Graduate Student
Undergraduate University: Tsinghua University
Office: M137
Lab: C011
Project: Deposition of ALD thin films




Name: Dr. Jun-Jieh Wang
Email: jjwang@fas.harvard.edu
Position: Post-Doctoral Fellow
Graduate University: Harvard University
Office: M123
Lab: M123, C010
Project: Synthesis of early transition metal-alkylidyne complexes as precursors to the atomic layer deposition (ALD) of metal-carbide thin films




Name: Sheng Xu
Email: shengxu@fas.harvard.edu
Position: Graduate Student
Office: Converse 108
Lab: M130A
Project: Carbon nanotube Fabrication and Coating